Chemical vapor generation of arsane in the presence of L-cysteine. Mechanistic studies and their analytical feedback

TitleChemical vapor generation of arsane in the presence of L-cysteine. Mechanistic studies and their analytical feedback
Publication TypeJournal Article
Year of Publication2007
AuthorsPitzalis, E, Ajala, D, Onor, M, Zamboni, R, D'Ulivo, A
JournalANALYTICAL CHEMISTRY
Volume79
Pagination6324–6333
ISSN0003-2700
Abstract

The complex reactivity of the system As-AH-RSH-THB (As = As(Ill), As(V); AH = HCl, HClO4, CH3COOH; RSH = L-cysteine (Cys); THB = NaBH4) was investigated using continuous flow (CF) hydride generation (HG) coupled either with atomic absorption (AAS) or atomic fluorescence spectrometry (AFS). AsH3 generation was examined in the presence of Cys by varying acidity and the type of acid, the mixing sequence, and the reaction time of reagents. The strong depression of arsane generation, which is typically observed in the range of acidity of 0.2-2 M HCl, can be addressed to the low reaction rate of thiol-borane, hydroboron complexes, or both toward those As(III) substrates that are formed in the same reaction environment. The simultaneous presence of Cys-borane and As(III)-Cys species is at the origin of the gap of the arsane generation efficiency in the 0.2-2 M HCl acidity range. The selective formation of Cys-borane complexes, which are formed faster than As(III)-thiol complexes, can be achieved by a careful choice of the mixing sequence of the reagents. The simultaneous mixing of sample, Cys, and THB is able to reduce substantially the gap of the arsane generation efficiency in the 0.2-2 M HCl acidity range. These properties were employed to implement a simple method for selective determination of As(III) in samples containing inorganic arsenic: (i) Total inorganic arsenic is determined by sample treatment with 0.2 M Cys for 30 min, acidity 0.1 M HCl, followed by CF-HG-AFS; (ii) As(III) is selectively determined in 0.005 M CH3COOH in the presence of Cys using a chemifold setup allowing the simultaneous mixing of sample, 0.2 M Cys and 0.1 M THB. The selectivity, measured from the ratio between the slopes of calibration graphs As(III)/As(V), is 220. The interference effects of Cu(II), Fe(III), Ni(II), Co(II), Ag(I), Pd(II), and Pt(IV) can be kept under control using the simultaneous mixing of all the reagents. The tolerance toward the interferences was almost the same as that obtained by allowing the formation of As(III)-Cys complexes (offline sample pretreatment with Cys for 30 min). The method was tested with the application to the natural waters and mineral well waters analysis employing CF-HG-AFS.

DOI10.1021/ac070513p